| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 612956 | Journal of Colloid and Interface Science | 2007 | 8 Pages |
The adsorption of poly(diallyldimethyl ammonium chloride) (DADMAC) on planar silica substrates was examined as a function of ionic strength and pH. The study was carried out with reflectometry in an impinging-jet cell and complemented by atomic force microscopy (AFM) and ellipsometry investigations. The adsorption process is initially transport limited, whereby the adsorption rate increases somewhat with increasing ionic strength. This effect is caused by a simultaneous decrease of the hydrodynamic radius of the polymer. After a transient period, the adsorption process saturates and leads to an adsorption plateau. The plateau value increases strongly with increasing ionic strength. This increase can be explained by progressive screening of the electrostatic repulsion between the adsorbing polyelectrolyte chains, as can be rationalized by a random sequential adsorption (RSA) model. The adsorbed amount further increases with increasing pH, and this effect is probably caused by the corresponding increase of the surface charge of the silica substrate.
Graphical abstractThe adsorption of poly(diallyldimethyl ammonium chloride) (DADMAC) on silica substrates quickly saturates, and the resulting surface coverage increases with salt level in accord with the random sequential adsorption (RSA) model.Figure optionsDownload full-size imageDownload as PowerPoint slide
