Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
645964 | Applied Thermal Engineering | 2015 | 11 Pages |
Abstract
A model is developed to estimate the evaporation rate for aluminum of specific mass used, exploited for thin film deposition process. This model is simulated using MATLAB-SIMULINK program that represented the resistive vaporization source. A feedback temperature sensor is used with Proportional Integral (PI) controller to force the temperature gradient to acquire a trajectory suitable for the evaporation process. The simulation results showed that the temperature gradient of 45Â K/s is necessary to reach the vaporization of aluminum in 20Â s. Experimental results showed that current gradient of 2Â A/s applied to the filament is sufficient to get temperature gradient suitable for Al melting. During the evaporation interval the current has to be constant at 50Â A for 20Â s in order to evaporate all Al parts. The study demonstrates that this technique will help in automating the vaporization process to avoid irregular coating reflection films on the surface of telescope and space vehicle mirrors.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Fluid Flow and Transfer Processes
Authors
Yosry A. Azzam, Afaf M. Abd El Hameed, Fatma S. El-Tokhy, Mohamed Ismail, M. El_harony, S.M. Sharaf,