Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
6979805 | Colloids and Surfaces A: Physicochemical and Engineering Aspects | 2014 | 9 Pages |
Abstract
- Colloidal lithography was used to create a rigid topographic nanostructure.
- This topography was covered with soft PDMS to create a surface mechanical contrast.
- Obtained surfaces had a limited topography and homogeneous surface chemistry.
- Mechanical contrast was evaluated using atomic force microscopy.
- Mechanical nanoheterogeneities are shown to direct MC3T3 cell response.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Colloid and Surface Chemistry
Authors
Simon Degand, Bernard Knoops, Christine C. Dupont-Gillain,