Article ID Journal Published Year Pages File Type
7001070 Journal of Colloid and Interface Science 2011 7 Pages PDF
Abstract
► XRR was used to study the structure of thin films of polyhedral oligomeric silsesquioxanes. ► The morphology of POSS films can be tuned by adjusting of different factors on the molecular scale. ► Different types of coatings (monolayer, bilayer or thicker film) are observed. ► The role of conformational and energetic factors is discussed.
Keywords
Related Topics
Physical Sciences and Engineering Chemical Engineering Colloid and Surface Chemistry
Preview
Morphological behavior of thin polyhedral oligomeric silsesquioxane films at the molecular scale
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