Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
701055 | Diamond and Related Materials | 2009 | 4 Pages |
Ultrananocrystalline diamond/amorphous carbon (UNCD/a-C) composite films have been prepared by microwave plasma chemical vapour deposition (MWCVD) from 17% CH4/N2 mixtures and modified with O2 and CHF3 plasmas, which changed the surface termination from hydrogen to oxygen and fluorine, respectively. X-ray photoelectron spectroscopy (XPS) showed that successful oxidation and fluorination of the UNCD surface has been achieved with surface O or F concentrations of ca. 12 at.%. None of the plasma modification processes led to a change of the film topography as studied by atomic force microscopy (AFM); for all samples the rms roughness was in the range of 10–12 nm. The UNCD/a-C films with different terminations were characterized by contact angle measurements with water, formamide and benzyl alcohol; from the results obtained the surface energy was calculated. The adsorption of albumin and fibrinogen to the different UNCD/a-C samples was assessed by an inverted enzyme-linked immunosorbent assay (ELISA). The determined albumin/fibrinogen ratios, which could be used to evaluate the tendency of thrombus formation, are correlated with the surface properties of as-deposited and modified UNCD/a-C films.