Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
701330 | Diamond and Related Materials | 2007 | 5 Pages |
Abstract
To obtain high blocking voltages and low forward losses in power diode structures, a Schottky contact can be merged with a MIS contact or a pn-junction. In this configuration, the Schottky contact is responsible for a low forward threshold voltage and the MIS or pn-junction for a low reverse leakage current and a high breakdown voltage. In this study, a diamond merged diode structure has been fabricated and evaluated, containing simultaneously an Al or W:Si-Schottky contact and a boron/nitrogen pn-junction. The IV characteristics show a low forward barrier of 1.5 eV, a current rectification ratio of 109 at R.T., and a reverse breakdown at 2.5 MV/cm. Rectification has been obtained up to 1000 °C (in vacuum).
Keywords
Related Topics
Physical Sciences and Engineering
Engineering
Electrical and Electronic Engineering
Authors
M. Kubovic, H. El-Hajj, J.E. Butler, E. Kohn,