| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 701346 | Diamond and Related Materials | 2007 | 4 Pages |
Abstract
Triode-type radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) equipment has been used in order to grow well-aligned carbon nanotubes on Si and glass substrates below 600 °C. This CVD equipment allows the growth of a well-aligned carbon nanotube with an inside and an outside diameter of 7 and 17 nm, respectively. The selective growth of the CNT was demonstrated.
Keywords
Related Topics
Physical Sciences and Engineering
Engineering
Electrical and Electronic Engineering
Authors
Yoshiyuki Show, Norihiko Fukuzumi,