| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 703415 | Diamond and Related Materials | 2008 | 5 Pages |
Abstract
The effects of gas pressure on the textured growth of diamond films were investigated in a hot filament chemical vapor deposition (HFCVD) system. Diamond thin film with the growth rate of 1.3 μm/h and with high <110> texture was obtained at 5 Torr when lowering the gas pressure from 40 Torr to 1 Torr. The formation of high density nanocrystalline diamond nuclei elongated along the <110> direction in the nucleation stage and its consequent growth at lower pressure were considered to be responsible for the formation of <110> textured diamond thin film.
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Authors
Shumin Yang, Zhoutong He, Qintao Li, Dezhang Zhu, Jinlong Gong,