Influence of the microwave plasma CVD reactor parameters on substrate thermal management for growing large area diamond coatings inside a 915Â MHz and moderately low power unit

► 915 MHz reactor parameters influence creation of suitable microwave plasma. ► Suitable plasma and substrate design produce substrate temperature uniformity. ► Uniform substrate temperature is essential for coating uniformity over a large area. ► Hereby, optimized process recipe deposits uniform polycrystalline diamond coatings. ► Thermal gradient of 7.6% over 90 mm diameter area yields 12.8% thickness variation.