Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7150906 | Solid-State Electronics | 2016 | 4 Pages |
Abstract
In this article, we report (IDS-VDS) characteristics of (75 and 35 nm) p-type ZnTe thin-film transistors (TFTs) at different active channels by photolithography. In 75 nm p-ZnTe TFTs, the source and drain contacts were doped with Cu in 11, 13 and 15 mg (Cu(NO3)2-3H2O)/150 ml (H2O) for 60 s and heated at 300 °C for 10 min. TFTs immersed in 15 mg solution showed the clearest linear and saturation regions, as well as an approximate mobility from 10â2 to 10â4 cm2/V s. Also, drain- currents (IDS) from 10â8 to â¼10â7 A were shown at VG = 0 V (OFF-state). However, drain-current in the OFF-state decreased in 35 nm p-ZnTe TFTs. The films showed the cubic phase and the Cu1.44Te-like orthorhombic phase.
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Authors
G. Lastra, A. Olivas, J.I. MejÃa, M.A. Quevedo-López,