Room-temperature CO2 sensing using metal–insulator–semiconductor capacitors comprising atomic-layer-deposited La2O3 thin films

Room temperature detection of CO2 using metal–insulator–silicon (MIS) devices is reported. These devices comprise atomic layer deposited La2O3 thin films as the gas-sensitive dielectric layer and Pt, Pt/Ta and Al as the electrodes. Physical mechanisms that lead to the detection of CO2 at room temperature are discussed.