| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 741104 | Sensors and Actuators B: Chemical | 2009 | 5 Pages |
Abstract
Grated silicon photonic wires for refractometric applications have been fabricated using a 248-nm deep UV lithography. It is shown experimentally, that a device with length of only 180 μm has an index sensitivity of 10−6 assuming a detector power resolution of 1%. It is also demonstrated that the device is suitable to monitor index changes in a liquid cladding, which could be used to monitor on chip chemical reactions.
Related Topics
Physical Sciences and Engineering
Chemistry
Analytical Chemistry
Authors
L.J. Kauppinen, H.J.W.M. Hoekstra, R.M. de Ridder,