Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
751231 | Sensors and Actuators B: Chemical | 2010 | 6 Pages |
Abstract
We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Analytical Chemistry
Authors
Antti J. Niskanen, Aapo Varpula, Mikko Utriainen, Gomathi Natarajan, David C. Cameron, Sergey Novikov, Veli-Matti Airaksinen, Juha Sinkkonen, Sami Franssila,