Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7718022 | International Journal of Hydrogen Energy | 2014 | 8 Pages |
Abstract
Ultrathin Ti-doped α-Fe2O3 photoanode was prepared by a facile atmospheric pressure chemical vapor deposition method through pyrolysis of ferrocene at 450 °C on Ti foil. The as prepared ultrathin hematite thin film has a surface feature size of 70 Ã 30 nm and a thickness of 50 nm. The photocurrent of this ultrathin hematite photoanode prepared at 450 °C in 1 M NaOH reaches 900 μA/cm2 at 0.6 VSCE under AM 1.5G illumination. The superior performance to the thin films prepared on FTO glass was ascribed to the diffusion and doping of Ti4+ from the metal substrate during pyrolysis deposition of hematite on Ti substrate.
Related Topics
Physical Sciences and Engineering
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Authors
Shipu Li, Peng Zhang, Xuefeng Song, Lian Gao,