| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7825917 | Progress in Polymer Science | 2018 | 50 Pages |
Abstract
Directed self-assembly (DSA) of BCP on topographic or chemically patterned substrates has attracted a great attention from academic and industrial research since it offers the advantage of defect free nanopatterning at large scales. The key achievements in DSA methods are elaborated in the subsequent parts of this review. New trends for lithographic applications and the applications beyond lithography using Si-containing BCPs for nanopatterning are also discussed, and finally, concluding remarks and perspectives for BCP lithography are presented.
Related Topics
Physical Sciences and Engineering
Chemistry
Organic Chemistry
Authors
Ting-Ya Lo, Mohan Raj Krishnan, Kai-Yuan Lu, Rong-Ming Ho,