Article ID Journal Published Year Pages File Type
7902271 Journal of Non-Crystalline Solids 2014 7 Pages PDF
Abstract
Molybdenum oxide thin films have been successfully prepared by direct UV irradiation of amorphous films of molybdenum dioxide tropolonate complexes on Si(100) substrates. Photodeposited films were characterized by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM). Gas sensing experiments showed that photodeposited MoO3 films have good sensitivity towards 50 ppm NH3 at an operating temperature of 350 °C.
Related Topics
Physical Sciences and Engineering Materials Science Ceramics and Composites
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