| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7963255 | Journal of Nuclear Materials | 2018 | 24 Pages |
Abstract
The determination of interstitial oxygen atom site in U2N3+xOy film could facilitate the understanding of the oxidation mechanism of α-U2N3 and the effect of U2N3+xOy on anti-oxidation. By comparing the similarities and variances between N K edge and O K edge electron energy loss spectra (EELS) for oxidized α-U2N3 and UO2, the present work looks at the local structure of nitrogen and oxygen atoms in U2N3+xOy film, identifying the most possible position of interstitial O atom.
Related Topics
Physical Sciences and Engineering
Energy
Nuclear Energy and Engineering
Authors
A.K. Jiang, Y.W. Zhao, Z. Long, Y. Hu, X.F. Wang, R.L. Yang, H.L. Bao, R.G. Zeng, K.Z. Liu,