| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 8036993 | Thin Solid Films | 2013 | 6 Pages |
Abstract
⺠Plasma enhanced chemical vapor deposition (PECVD) at pressure less than 5 Pa ⺠Magnetron based magPECVD process with dynamic coating rates up to 400 nm m/min ⺠Hollow cathode arc based arcPECVD process shows up to 2700 nm m/min. ⺠Both processes can be used inline to sputtering for optical or barrier stacks. ⺠The so prepared coating stacks showed nearly no layer stress.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Steffen Günther, Matthias Fahland, John Fahlteich, Björn Meyer, Steffen Straach, Nicolas Schiller,