Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
8146764 | Infrared Physics & Technology | 2015 | 4 Pages |
Abstract
In this paper, we synthesize and characterize a thin film thermometer structure for infrared microbolometers. The structure is composed of alternating multilayers of Vanadium pentoxide (V2O5), 25 nm, and Vanadium (V), 5 nm, thin films deposited by rf magnetron and dc magnetron sputtering respectively and annealed for 20, 30 and 40 min at 300 °C in Nitrogen (N2) atmosphere. The best achieved temperature coefficient of resistance (TCR) was found to be â2.57%/K for 40 min annealed samples. Moreover, we apply, for the first time, the photo-thermal deflection (PTD) technique for measuring the thermal conductivity of the synthesized thin films. The thermal conductivity of the developed thin films reveals an increase in thermal conductivity from 2 W/m K to 5.8 W/m K for as grown and 40 min annealed samples respectively.
Related Topics
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Authors
M. Abdel-Rahman, S. Ilahi, M.F. Zia, M. Alduraibi, N. Debbar, N. Yacoubi, B. Ilahi,