| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 815347 | Rare Metal Materials and Engineering | 2008 | 4 Pages |
Abstract
F-doped tin oxide (Sn:F) film was prepared by atmosphere pressure chemical vapor deposition (APCVD) on float glass using monobutyltin trichloride (C4H9SnCl3, MBTC) and trifluoro acetic acid (CF3COOH, TFA) as the precursor and dopant, respectively. H2O with different concentrations was used as the activator. The prepared films were characterized by means of XRD, SEM, and UV-VIS-NIR spectroscopy. Experimental results reveal that the structures and properties of the films are greatly affected by the H2O content. H2O in a certain range of concentrations will promote the formation of Sn:F film and improve the properties of the films.
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Mechanics of Materials
