The adsorption and dissociation of oxygen on Ag (111) supported χ3 borophene

The superstructure of χ3 borophene on Ag (111) has recently been synthesized in experiment. In this work, we investigate its structural, electronic properties and the oxidation mechanism through first-principles calculations. We find the superstructure of χ3 borophene on Ag (111) maintain the planar characteristics, like its free-standing form, owing to the weakly interaction between adsorbate and substrate. Moreover, oxygen molecule can be spontaneously adsorbed on its superstructure in a manner of chemical adsorption. Importantly, the energy barrier of ∼0.35 eV for oxygen dissociation indicates its relative stability in ambient conditions compared with the active silicene. Furthermore, the mobility of O2-dissociation-induced O atom is poor at room temperature, implying the difficult migration of O atom on borophene surface. On the other hand, due to the strong BO bonding, desorption of O2-dissociation-induced O atoms on superstructure of χ3 borophene becomes impossible, ultimately leading to form the boron oxides.