Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
9778124 | Journal of Non-Crystalline Solids | 2005 | 6 Pages |
Abstract
The chemical vapor deposition (CVD) has 'dusty plasma' condition region, under which circumstances there is a strong tendency for formation of nano-particles in the plasma by aggregation of ions. Using this phenomena carbon nano-particles have been prepared simultaneously with solid hydrogenated amorphous carbon (a-C:H) films. Transmission electron microscopy (TEM) and atomic force microscopy (AFM) were used to study the morphology of nano-particles and the film surfaces as well. Size distributions and shape factors of nano-clusters have been obtained from TEM results; their change with applied self-bias voltage was also examined. The bonding properties of deposited layers and nano-clusters were investigated by infrared spectroscopy. A comparative analysis concerning the morphology of the films and the nano-clusters was performed.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
M. Veres, M. Füle, S. Tóth, M. Koós, I. Pócsik, J. Kokavecz, Z. Tóth, G. Radnóczi,