Article ID Journal Published Year Pages File Type
984963 Research Policy 2007 12 Pages PDF
Abstract

A new comprehensive patent database based on patent applications filed with the Japanese Patent Office is described. We present the methodology for the construction of this database, the IIP Patent Database, its basic features and we discuss the recent history of patenting in Japan. We also compare citing–cited patterns of Japanese patents in this database with the citing–cited patterns for the same patents registered in the US, using OECD patent family information to identify US counterparts. We found similar patterns in the two countries, although citation is provided by patent examiners in Japan, while in the US a large share of citations is made by inventors.

Related Topics
Social Sciences and Humanities Business, Management and Accounting Business and International Management
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