Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
984963 | Research Policy | 2007 | 12 Pages |
Abstract
A new comprehensive patent database based on patent applications filed with the Japanese Patent Office is described. We present the methodology for the construction of this database, the IIP Patent Database, its basic features and we discuss the recent history of patenting in Japan. We also compare citing–cited patterns of Japanese patents in this database with the citing–cited patterns for the same patents registered in the US, using OECD patent family information to identify US counterparts. We found similar patterns in the two countries, although citation is provided by patent examiners in Japan, while in the US a large share of citations is made by inventors.
Related Topics
Social Sciences and Humanities
Business, Management and Accounting
Business and International Management
Authors
Akira Goto, Kazuyuki Motohashi,