Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10364490 | Microelectronics Journal | 2005 | 4 Pages |
Abstract
We present, in this work, our preliminary results of a systematic theoretical study of the adsorption of N over As-terminated GaAs (100) (2Ã1) surfaces. We analyzed the changes in the bond-lenghts, bond-angles and the energetics involved before and after deposition. Our results show that the N-atoms will prefer the unoccupied sites of the surface, close to the As dimer. The presence of the N pushes the As dimer out of the surface, leading to the anion exchange between the N and As atoms. Based on our results, we discussed about the kinetics of the N island formation during epitaxial growth of the III-Nitrides.
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Authors
A.P. Castro, H.W. Leite Alves,