Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10364724 | Microelectronics Reliability | 2015 | 12 Pages |
Abstract
Whisker growth studies indicate that deposition parameters have a significant effect on both whisker density and whisker morphology. As deposition current density is increased there is a reduction in whisker density and a transition towards the formation of large eruptions rather than potentially more harmful filament whiskers. Increasing the tin coating thickness also results in a reduction in whisker density. Results demonstrate that whisker growth is most prolific from tin deposits on brass, whilst that from tin deposits on rolled silver is greater than that observed for tin deposits on copper.
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Authors
M.A. Ashworth, G.D. Wilcox, R.L. Higginson, R.J. Heath, C. Liu, R.J. Mortimer,