Article ID Journal Published Year Pages File Type
10364838 Microelectronics Journal 2013 5 Pages PDF
Abstract
► Virtually dopant-free CMOS multi-gate silicon-nanowire FET SOI technology. ► Midgap Schottky-barrier source/drain enabling carrier tunneling. ► Use of Schottky-barriers provides low source/drain leakage. ► Asymmetric workfunction metal not suitable for NWFET technology. ► Voltage selectable NWFET types add to flexibility in circuit design.
Related Topics
Physical Sciences and Engineering Computer Science Hardware and Architecture
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