Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10364838 | Microelectronics Journal | 2013 | 5 Pages |
Abstract
⺠Virtually dopant-free CMOS multi-gate silicon-nanowire FET SOI technology. ⺠Midgap Schottky-barrier source/drain enabling carrier tunneling. ⺠Use of Schottky-barriers provides low source/drain leakage. ⺠Asymmetric workfunction metal not suitable for NWFET technology. ⺠Voltage selectable NWFET types add to flexibility in circuit design.
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Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Frank Wessely, Tillmann Krauss, Udo Schwalke,