Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10365669 | Microelectronics Reliability | 2014 | 7 Pages |
Abstract
An early life failure mechanism was discovered on a 0.25-µm 40 V GaN FET technology. Through accelerated life testing (ALT), it was determined that the early life failure mechanism was thermally accelerated with a high activation energy, which means that it is not a concern a normal operating conditions up to the maximum rated junction temperature. Subsequent improvements to the process resulted in elimination of the early life failure mechanism. With the improved process, single-mode ALT lifetime distributions and excellent reliability performance down to low failure fractions were demonstrated.
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Hardware and Architecture
Authors
Donald A. Gajewski, Randall D. Lewis, Benjamin M. Decker,