The mathematical expression for kinetics of electrophoretic deposition and the effects of applied voltage

Electrophretic deposition (EPD) is a ceramic process. Although the kinetics for EPD have been established. However, there are still some ambiguities. In present study, a modified kinetic model was applied to describe the completely different behavior of EPD at −10 and −40 V respectively. The variation of the concentration profile during electrophoretical deposition at −10 and −40 V was simulated to explain what affected the EPD process. Based on the simulation, the depletion of colloidal particles near the electrode may be responsible for the EPD kinetic behaviors.