Kinetic model of NO removal from SO2-containing simulated flue gas by wet UV/H2O2 advanced oxidation process

Based on the steady-state approximation method, the kinetic model of NO removal from SO2-containing simulated flue gas by wet UV/H2O2 advanced oxidation process (AOP) were deduced. Furthermore, in order to verify the kinetic model, the effects of several parameters, including H2O2 initial concentration, UV lamp power, NO initial concentration and reaction temperature, on NO removal process, were studied preliminarily. The results showed that the kinetic model derived could satisfactorily fit the experimental results. The removal process of NO from SO2-containing simulated flue gas by the wet UV/H2O2 AOP was a pseudo-first-order reaction for NO.