Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
545807 | Microelectronics Reliability | 2008 | 5 Pages |
Abstract
Because of its large dimension and its high level of integration, the PICS (Passive Integration Connecting Substrate) developed by NXP prone to top to bottom metal short (TBMS) failure during temperature cycling test. Several options of process modifications as well as new design rules and stress relief patterns for preventing TBMS failure are described. These countermeasures have been evaluated under high thermo-mechanical stress test. The results of these evaluations are also presented in this paper.
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Physical Sciences and Engineering
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Authors
Christian Gautier, Sophie Ledain, Sébastien Jacqueline, Matthieu Nongaillard, Vincent Georgel, Karine Danilo,