Article ID Journal Published Year Pages File Type
545987 Microelectronics Reliability 2007 4 Pages PDF
Abstract

Metal–ferroelectric–insulator–semiconductor (MFIS) capacitors and field effect transistors with the structures of Al/Pb (Zr0.53, Ti0.47) O3 (PZT)/Dy2O3/Si and Al/PZT/Y2O3/Si were fabricated. The memory windows of Al/PZT/Dy2O3/Si and Al/PZT/Y2O3/Si capacitors with sweep voltage of 10 V are 1.03 V and 1.48 V, respectively. The effect of band offset on the memory window was discussed. The retention times of Al/PZT/Y2O3/Si and Al/PZT/Dy2O3/Si MFISFETs are 11.5 days and 11.1 h, respectively. The longer retention time of Al/PZT/Y2O3/Si field effect transistors is attributed to the larger conduction band offset at the Y2O3/Si interface (2.3 eV) compared to that of Dy2O3/Si (0.79 eV).

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