Article ID Journal Published Year Pages File Type
545999 Microelectronics Reliability 2007 4 Pages PDF
Abstract

Measurements of some barrier parameters – thickness, hole effective mass – in the Al/SiO2/Si system, are carried out on the Metal-Oxide-Semiconductor (MOS) tunnel emitter transistors. For the high-doping case, the effect of resonant carrier transport via discrete levels in a quantum well of the depletion layer is considered and used for thickness estimation. Degradation of an MOS emitter is paid attention to. Hot electron injection related phenomena in silicon, namely electron–hole pair generation and photon emission, are quantitatively studied.

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