Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
546010 | Microelectronics Reliability | 2007 | 4 Pages |
Abstract
The introduction of new chemicals into semiconductor production processes is an expensive, time consuming exercise. A key parameter required to ensure equipment set up is well suited to the source from the outset of trials is reliable precursor volatility data. In this paper we present the latest vapour pressure values for the technologically interesting Hf and Ru precursors and corresponding thermogravimetric analysis results. A discussion on the interpretation of the values obtained highlights the careful considerations required to ensure promising source materials are not ruled out prematurely.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Simon Rushworth, Hywel Davies, Andrew Kingsley, Thomas Leese, Rajesh Odedra,