Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
546202 | Microelectronics Reliability | 2006 | 5 Pages |
Abstract
Modern applications of source characteristic based quantitative thermal microscopy in the nanometer regime require optimized probe characteristics with respect to both, geometry and electrical / thermal dynamic source behaviour. Within this field of dynamic techniques completely different approaches are available. Exemplarily for these different approaches the capability of a special resistive thermal probe will be investigated by means of transient 3D thermal electrical coupled Finite Element Analysis (FEA) within this work.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture