Article ID Journal Published Year Pages File Type
546202 Microelectronics Reliability 2006 5 Pages PDF
Abstract

Modern applications of source characteristic based quantitative thermal microscopy in the nanometer regime require optimized probe characteristics with respect to both, geometry and electrical / thermal dynamic source behaviour. Within this field of dynamic techniques completely different approaches are available. Exemplarily for these different approaches the capability of a special resistive thermal probe will be investigated by means of transient 3D thermal electrical coupled Finite Element Analysis (FEA) within this work.

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