| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 547021 | Microelectronics Reliability | 2012 | 4 Pages |
Abstract
Some integrated circuit manufacturing processes produce variation which is strongly correlated between devices physically near each other but not correlated between devices which are widely separated. Devices separated by intermediate distances are partial correlated. In this paper we describe a method to characterize and model variation which shows this type of spatial correlations.
► Spatially correlated device variations within integrated circuits. ► Compact model Monte Carlo implementation. ► Variation represented as Sine function of position. ► Uses X–Y coordinate information from LVS. ► Amplitude, wavelength and phase are random variables.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Josef Watts, Henry Trombley,