| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 547114 | Microelectronics Reliability | 2012 | 5 Pages |
The noise performance of p-channel Double Gate FinFETs has been studied with varying structural parameters. The effects of mobility degradation due to velocity saturation, carrier heating and channel length modulation have been taken into consideration for an accurate modeling of noise. The dependence of mobility fluctuations on the inversion carrier density has been incorporated. This has been validated by the experimental results. The noise behavior of p-channel device has been compared to that of a corresponding n-channel device. It has been observed that noise in p-channel device is comparatively higher due to higher number of oxide-trap density in it. Further, it has been noted that with the same trap density in both p-channel and n-channel device, the flicker noise in the p-channel device is lower than that of the corresponding n-channel device.
