Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
547173 | Microelectronics Journal | 2014 | 7 Pages |
Abstract
This paper is the ongoing research report and discusses important aspects of new investigation method selected for interconnects reliability and ageing which has to be considered in nano-scale. The research is ongoing and applies to heterogeneous device structures like SiP, SoC where mechanical stress caused by thermal cycling, heat dissipation, assembly technique etc. distributes inside thin layers of metal interconnects.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
G. Janczyk, T. Bieniek, J. Wasowski, P. Grabiec,