| Article ID | Journal | Published Year | Pages | File Type | 
|---|---|---|---|---|
| 547662 | Microelectronics Reliability | 2007 | 4 Pages | 
Abstract
												Advanced micro-mechanical characterization methods provide material properties of thin films for modeling thermo-mechanical behavior of thin films for micro-electronic applications. Here, we focus on the local measurement method of nanoindentation for finding visco-elastic properties, and a global method of substrate curvature testing that provides linear elastic properties. Our specimen SiLK, Dow chemicals, is a low-k dielectric thin polymer film with a thickness of 400 nm, 6 and 8 μm, deposited on Si substrate. Our results show temperature dependent linear elastic and linear visco-elastic material properties for thin film materials.
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											Authors
												V. Gonda, K.M.B. Jansen, L.J. Ernst, J. den Toonder, G.Q. Zhang, 
											