| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 547887 | Microelectronics Journal | 2008 | 5 Pages |
Abstract
Micro-Raman spectroscopy was used to characterize beveled Zn delta (δ)-doped GaAs structures. By adapting procedures previously developed for the study of Si δ-doped GaAs structures, Zn-doping profiles were obtained for a set of structures prepared with different doping levels. Values of the doping spike concentration and the full-width at half-maximum of the doping profile were compared with the values obtained by the electrochemical capacitance–voltage (EC–V) and secondary ion mass spectroscopy (SIMS) methods. The good correspondence between this Raman procedure and other well-known methods proves the validity of the technique for determining doping profiles in Zn δ-doped GaAs structures.
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Authors
R. Srnanek, G. Irmer, D. Donoval, J. Osvald, D. Mc Phail, A. Christoffi, B. Sciana, D. Radziewicz, M. Tlaczala,