Fabrication of low-loss thin film microstrip line on low-resistivity silicon for RF applications

A detail fabricating process and characterization of thin film microstrip line (TFML) on low K polyimide, used for interconnects in radio frequency integrated circuits (RFICs) technology, is reported in this study. By incorporating a spin-on dielectric polyimide and sputtering of aluminum, the TFML is fabricated on low-cost low-resistivity silicon (LRS) substrate (ρ⩽10 Ω cm). The TFML with a thickness of 20 μm polyimide dielectric layer presents attenuation losses of 0.385 dB/mm at 25 GHz and 0.438 dB/mm at 50 GHz. Effective dielectric constant and attenuation of TFML on polyimide are carefully investigated and discussed.