Effect of doping concentration on avalanche multiplication and excess noise factor in submicron APD

A realistic full-band Monte Carlo (FBMC) model is applied to study the effect of doping concentration on multiplication gain and excess noise factor for electron- and hole-initiated multiplication in thin InP p+–i–n+ diodes with a range of multiplication lengths of w = 0.1 and 0.24 μm. This model predicts a reduction in excess noise factor for both electron- and hole-initiated multiplication as the doping concentration increases. Besides dead-space effect and feedback impact ionization, the electric field profile controlled by the doping concentration significantly contributes to the fall of excess noise in submicron InP p+–i–n+ diodes.