Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
549307 | Microelectronics Reliability | 2011 | 4 Pages |
Abstract
The goal of conducted investigations was to study microstructure and surface morphology of copper thin films deposited during standard (with argon) and self-sustained (without argon presence) magnetron sputtering deposition processes. Different types of magnetron source powering were used: direct current (DC), medium frequency (MF), pulsed-DC. The investigated copper films were deposited by means of balanced magnetron sputtering source on Si (1 1 1) substrates. The results of investigations showed that the average size of the copper crystallites of all samples were equal to dozens of nanometre. However, the self-sustained sputtering deposition processes, in comparison to the standard ones, resulted in smoother film surface.
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Authors
A. Wiatrowski, W.M. Posadowski, G. Jóźwiak, J. Serafińczuk, R. Szeloch, T. Gotszalk,