Fabrication of micro-moiré gratings on a strain sensor structure for deformation analysis with micro-moiré technique

In this study, the electron beam lithography technique is applied to fabricate moiré grating on the tiny structure of a strain gauge sensor. The grating fabrication technique is discussed in detail. The grating pattern is controlled by a pattern generator, which makes it possible to write a graph in the assigned region of the resist using the electron beam, and as a result a moiré grating is left on the surface of the sample. By the aid of the fabricated grating with electron moiré technique under the scanning electron microscope (SEM), the residual deformation of strain gauge sensor is measured after a direct voltage is imposed to it. The successful results verify the feasibility of the moiré grating fabrication using electron beam lithography, and the grating has a good potential for further application.