An experimental study of the thermally activated processes in polycrystalline silicon thin film transistors

The thermally activated mechanisms that determine the electrical properties of polycrystalline silicon thin film transistors have been investigated. The study employed devices fabricated on long grains and different thickness polycrystalline films, which were obtained by excimer laser annealing crystallization. The transfer and the transient characteristics have been recorded and analysed in the linear operation regime. The temperature dependence of basic parameters such as leakage current, subthreshold swing and drain current overshoot transient amplitude was found to stem from the same thermally activated carriers generation mechanism. The dependence of thermally activated mechanisms on the film thickness suggests that the device operation is strongly related to polycrystalline material properties.