Article ID Journal Published Year Pages File Type
6945498 Microelectronics Reliability 2018 10 Pages PDF
Abstract
In this paper the analysis of the influence of the temperature time lag and the heat flux time lag on the temperature distribution obtained using Dual-Phase-Lag heat transfer model is presented. Due to this fact, the modern GAAFET structure, developed in 5 nm technology node, has been taken into account. The simulation presents the influence of mentioned time lags on the temperature distribution inside analyzed structure for different time instants in three cases. The first one is related to the situation when the temperature time lag is changing and the value of the heat flux time lag is fixed. The second one concerns the changing value of the heat flux time lag and fixed value of the temperature time lag. The last case allows changing of these two parameters simultaneously. Apart from that, the temperature distributions inside the structure for some pairs of different values of analyzed time lags have been also evaluated and compared for certain time instants.
Related Topics
Physical Sciences and Engineering Computer Science Hardware and Architecture
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