Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
6945666 | Microelectronics Reliability | 2018 | 4 Pages |
Abstract
Sub-gap density of states (DOS) is one of the key parameters which impact both the electrical characteristics and reliability of amorphous In-Ga-Zn-O (a-IGZO) thin-film transistors. So the investigation of DOS extraction is important. Here, a simplified and efficient DOS extraction method based on a single capacitance-voltage (C-V) curve is proposed. The method is verified by comparing with the results from the existing DOS extraction methods such as static current-voltage (I-V) measurement. Besides, this method is applied to extract DOS of an a-IGZO thin-film transistor with different electrical properties. This updated method is employed to explain the decrease of device turn-on voltage, which could be attributed to the DOS decrease. In summary, it is a simple method based on a single C-V curve without optical illumination, temperature dependence, accurate I-V model supporting or complicated mathematics fitting.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Weiliang Wang, Pengjun Wang, Mingzhi Dai,