Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
6946898 | Microelectronics Reliability | 2014 | 5 Pages |
Abstract
In this work we present a numerical, multi-scale approach to estimate the strength of a wafer-to-wafer metallic thermo-compression bonding. Following a top-down approach, the mechanical problem is handled at three different length scales. Taking into account control variables such as temperature, overall applied force over the wafer and contact surface roughness, it is shown that the proposed approach is able to provide an estimate of the sealing properties, especially in terms of bonding strength.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Aldo Ghisi, Stefano Mariani, Alberto Corigliano, Giorgio Allegato, Laura Oggioni,