Pattern image enhancement by extended depth of field

Most optical defect localization techniques such as dynamic laser stimulation or photon emission microscopy require a pattern image of the device to be taken. The main purpose is for device navigation, but it also enables the analyst to identify the location of the monitored activity by superimposing it onto the pattern image. The defect localization workflow usually starts at low or medium magnification. At these scales, several factors can lead to a lack of orthogonality of the sample with the optical axis of the system. Therefore, images can be locally out of focus and poorly resolved. In this paper, a method based on Depth of Field Extension is suggested to correct the pattern image.