| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6947103 | Microelectronics Reliability | 2012 | 4 Pages |
Abstract
In this work the Sample Preparation on MIM structure in order to observe the untouched dielectric oxide is shown. A real case of Failure Analysis has been reported in which a very thin oxide crack on MIM structure has been found.
Related Topics
Physical Sciences and Engineering
Computer Science
Hardware and Architecture
Authors
Giancarlo Calvagno, Giuseppe Muni, Andrea Jossa, Domenico Mello,