Article ID Journal Published Year Pages File Type
9623855 Chemical Engineering Journal 2005 8 Pages PDF
Abstract
The vortex centrifugal bubbling apparatus is considered as a basis for a new type of multiphase vortex centrifugal bubbling reactor. In this device, a highly dispersed gas-liquid mixture is produced in the field of centrifugal forces inside the vortex chamber. The operation of the vortex centrifugal bubbling apparatus is based on the rotation of liquid by the tangential entry of gas flows via the many tangential guiding vanes around the periphery of the vortex chamber. At certain regimes there appears a highly dispersed gas-liquid vortex bubbling layer. Vortex bubbling layer represents the following unique characteristics: low hydrodynamic resistance (1000-2000 Pa); homogeneity and stability over wide range of centrifugal acceleration (102 to 103 m/s2); large specific surface with the high renovation rate (of about 5 m2 per 1 l of water); high gas content (of about 0.5-0.6); high gas throughput (up to 200-300 m3 of gas per 1 l of liquid per hour) and, consequently, very high rates of heat and mass transfer. The energy consumption for the vortex bubbling layer maintenance is about 50-80 W per 1 l of treated liquid. The design features of the vortex chamber are described in view of the methods of stabilization of the vortex bubbling layer. The data on the hydrodynamic resistance, the structure and the lifetime of the vortex gas-liquid layer are presented. The main advantages and features of the devices of this type are discussed in view of their possible application.
Related Topics
Physical Sciences and Engineering Chemical Engineering Chemical Engineering (General)
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